AlSi Target

Using plasma as heat source, Si + Al powder was heated to molten or semi molten state by a certain atmosphere protection device in atmospheric environment, and then compact coating was formed by high-speed impact on the surface of back pipe, so as to get high-purity, low oxygen content and high density sial target.

Purity: 99.999%

Aluminum content: 8-10%

Fe:≤350ppm

Ca:≤50ppm

Cu:≤50ppm

Mg:≤20ppm

Ni:≤20ppm

O:≤6000ppm

N:≤500ppm

Size: Φ 254 × 12mm or customers requirement

Density: 2.7g/cm3

Melting point: 660 ℃

Resistivity: ≤ 50 (m Ω. Cm)

Back pipe material: 304 / 316L stainless steel (non magnetic)

Application:

SiO2 film and Si3N4 film

Optical glass AR film

Low-E coated glass

Semiconductor electronic components

TFT-LCD

Flat panel display, touch screen glass